- All sections
- C - Chemistry; metallurgy
- C08F - Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
- C08F 220/18 - Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
Patent holdings for IPC class C08F 220/18
Total number of patents in this class: 3788
10-year publication summary
|
246
|
249
|
312
|
338
|
346
|
414
|
437
|
380
|
321
|
92
|
| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Rohm and Haas Company | 2805 |
194 |
| 3m Innovative Properties Company | 18406 |
181 |
| BASF SE | 19740 |
169 |
| LG Chem, Ltd. | 17205 |
151 |
| Dow Global Technologies LLC | 10147 |
137 |
| FUJIFILM Corporation | 27102 |
102 |
| Shin-Etsu Chemical Co., Ltd. | 5132 |
77 |
| JSR Corporation | 2476 |
61 |
| Arkema France | 3790 |
57 |
| Zeon Corporation | 3854 |
57 |
| Henkel AG & Co. KGaA | 10129 |
56 |
| Evonik Operations GmbH | 3879 |
45 |
| Sumitomo Chemical Company, Limited | 8808 |
44 |
| Mitsubishi Chemical Corporation | 4313 |
42 |
| Tokyo Ohka Kogyo Co., Ltd. | 1481 |
38 |
| Kuraray Co., Ltd. | 3392 |
33 |
| PPG Industries Ohio, Inc. | 3430 |
32 |
| Canon Inc. | 36841 |
31 |
| Tesa SE | 1011 |
31 |
| Samsung SDI Co., Ltd. | 6671 |
26 |
| Other owners | 2224 |